@prefix sampledescriptionvocabulary1: <https://purls.helmholtz-metadaten.de/skosmos/sdv/> .
@prefix skos: <http://www.w3.org/2004/02/skos/core#> .
@prefix ns0: <http://server/unset-base/> .

sampledescriptionvocabulary1:PulsedLaserDeposition
  skos:prefLabel "Pulsed laser deposition" ;
  skos:definition """1. A synthesis technique where a high-power pulsed laser beam is focused (inside a vacuum chamber) onto a target of the desired composition. Material is then vaporized from the target ('ablation') and deposited as a thin film on a substrate facing the target. (TIB, Chemical Methods Ontology)
2. Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). (Wikipedia)"""^^ns0:None ;
  skos:broader sampledescriptionvocabulary1:PhysicalVaporDeposition ;
  a skos:Concept .

sampledescriptionvocabulary1:PhysicalVaporDeposition
  skos:prefLabel "Physical vapor deposition" ;
  a skos:Concept ;
  skos:narrower sampledescriptionvocabulary1:PulsedLaserDeposition .