@prefix sampledescriptionvocabulary1: <https://purls.helmholtz-metadaten.de/skosmos/sdv/> .
@prefix skos: <http://www.w3.org/2004/02/skos/core#> .
@prefix ns0: <http://server/unset-base/> .

sampledescriptionvocabulary1:FocusedIonBeamLithography
  skos:prefLabel "Focused Ion beam lithography" ;
  skos:definition """1. Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM). (Wikipedia).
2. Focused Ion Beams (FIB) enable precise material removal and modification at the nanoscale, vital for device fabrication and nanofabrication. (https://raith.com/products/focused-ion-beams/)."""^^ns0:None ;
  skos:broader sampledescriptionvocabulary1:Lithography ;
  a skos:Concept .

sampledescriptionvocabulary1:Lithography
  skos:prefLabel "Lithography" ;
  a skos:Concept ;
  skos:narrower sampledescriptionvocabulary1:FocusedIonBeamLithography .