@prefix sampledescriptionvocabulary1: <https://purls.helmholtz-metadaten.de/skosmos/sdv/> .
@prefix skos: <http://www.w3.org/2004/02/skos/core#> .
@prefix ns0: <http://server/unset-base/> .

sampledescriptionvocabulary1:AtomicLayerDeposition
  skos:prefLabel "Atomic layer deposition" ;
  skos:definition """1. A thin film deposition technique based on the sequential reaction of gaseous precursors at a surface to produce a monolayer (Ontobee, Chemical Methods Ontology).
2. Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. (Wikipedia)"""^^ns0:None ;
  skos:broader sampledescriptionvocabulary1:DepositionCoating ;
  a skos:Concept .

sampledescriptionvocabulary1:DepositionCoating
  skos:prefLabel "Deposition coating" ;
  a skos:Concept ;
  skos:narrower sampledescriptionvocabulary1:AtomicLayerDeposition .