优选词，正式主题词
Reactive ion etching
定义
某概念特定涵义的完全解释- 1. RIE is like sputtering in the argon chamber, but the polarity is reversed and different gas mixtures are used. The atoms on the surface of the wafer fly away, leaving it bare. (Britannica). 2. Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.(Wikipedia)
上位概念
上位概念其它语言
其它语言中概念术语- Reactive ion etching
URI
https://purls.helmholtz-metadaten.de/skosmos/sdv/ReactiveIonEtching