优选词，正式主题词
Chemical vapor deposition
定义
某概念特定涵义的完全解释- 1. Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. (Wikipedia). 2. A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit.(Chemical Methods Ontology)
上位概念
上位概念其它语言
其它语言中概念术语- Chemical vapor deposition
URI
https://purls.helmholtz-metadaten.de/skosmos/sdv/ChemicalVaporDeposition