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Atomic layer deposition

定义

某概念特定涵义的完全解释
  • 1. A thin film deposition technique based on the sequential reaction of gaseous precursors at a surface to produce a monolayer (Ontobee, Chemical Methods Ontology). 2. Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. (Wikipedia)

上位概念

上位概念

其它语言

其它语言中概念术语

  • Atomic layer deposition

URI

https://purls.helmholtz-metadaten.de/skosmos/sdv/AtomicLayerDeposition

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