Föredragen term
Reactive ion etching
Definition
Uttömmande beskrivning av begreppets betydelse.- 1. RIE is like sputtering in the argon chamber, but the polarity is reversed and different gas mixtures are used. The atoms on the surface of the wafer fly away, leaving it bare. (Britannica). 2. Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.(Wikipedia)
Överordnat begrepp
Begrepp/term vars betydelse är vidare.Termer på andra språk
Termer för begreppet på andra språk.- Reactive ion etching
engelska
URI
https://purls.helmholtz-metadaten.de/skosmos/sdv/ReactiveIonEtching