Föredragen term
Chemical vapor deposition
Definition
Uttömmande beskrivning av begreppets betydelse.- 1. Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. (Wikipedia). 2. A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit.(Chemical Methods Ontology)
Överordnat begrepp
Begrepp/term vars betydelse är vidare.Termer på andra språk
Termer för begreppet på andra språk.- Chemical vapor deposition
engelska
URI
https://purls.helmholtz-metadaten.de/skosmos/sdv/ChemicalVaporDeposition