Termo preferencial
Atomic layer deposition
Definição
Enunciado explicativo do conceito.- 1. A thin film deposition technique based on the sequential reaction of gaseous precursors at a surface to produce a monolayer (Ontobee, Chemical Methods Ontology). 2. Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. (Wikipedia)
Conceito superordenado
Conceito mais amplo na hierarquia.Termos equivalentes
Termos para o conceito noutras línguas.- Atomic layer deposition
URI
https://purls.helmholtz-metadaten.de/skosmos/sdv/AtomicLayerDeposition