Tilrådd term
Reactive ion etching
Definisjon
Beskriving og avgrensing av omfanget til omgrepet.- 1. RIE is like sputtering in the argon chamber, but the polarity is reversed and different gas mixtures are used. The atoms on the surface of the wafer fly away, leaving it bare. (Britannica). 2. Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.(Wikipedia)
Overordna omgrep
Overordna omgrepPå andre språk
Termar brukt om det same omgrepet på andre språk.- Reactive ion etching
engelsk
URI
https://purls.helmholtz-metadaten.de/skosmos/sdv/ReactiveIonEtching