Hopp til hovudinnhaldet

SampleDescriptionVocabulary

Søk i ordtilfang

Innhaldsspråk

Informasjon om omgrepet

... > Physical system > Processing and Treatment (for both Material and Sample) > Treatment > Surface treatment > Surface structuring > Surface structuring method > Lithography > Focused Ion beam lithography

Tilrådd term

Focused Ion beam lithography  

Definisjon

  • 1. Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM). (Wikipedia). 2. Focused Ion Beams (FIB) enable precise material removal and modification at the nanoscale, vital for device fabrication and nanofabrication. (https://raith.com/products/focused-ion-beams/).

Overordna omgrep

URI

https://purls.helmholtz-metadaten.de/skosmos/sdv/FocusedIonBeamLithography

Last ned dette omgrepet:

RDF/XML TURTLE JSON-LD