Tilrådd term
Atomic layer deposition
Definisjon
Beskriving og avgrensing av omfanget til omgrepet.- 1. A thin film deposition technique based on the sequential reaction of gaseous precursors at a surface to produce a monolayer (Ontobee, Chemical Methods Ontology). 2. Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. (Wikipedia)
Overordna omgrep
Overordna omgrepPå andre språk
Termar brukt om det same omgrepet på andre språk.- Atomic layer deposition
engelsk
URI
https://purls.helmholtz-metadaten.de/skosmos/sdv/AtomicLayerDeposition