Hopp til hovedinnholdet.

SampleDescriptionVocabulary

Søk fra vokabular

Innholdsspråk

Begrepsinformasjon

Det finnes ingen termer for dette begrepet på dette språket

... > Physical system > Processing and Treatment (for both Material and Sample) > Treatment > Surface treatment > Mechanical and surface treatment > Mechanical and surface treatment method > Etching > Reactive ion etching
... > Physical system > Processing and Treatment (for both Material and Sample) > Treatment > Surface treatment > Surface structuring > Surface structuring method > Etching > Reactive ion etching

Anbefalt term

Reactive ion etching  

Definisjon

  • 1. RIE is like sputtering in the argon chamber, but the polarity is reversed and different gas mixtures are used. The atoms on the surface of the wafer fly away, leaving it bare. (Britannica). 2. Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.(Wikipedia)

Overordnede begreper

På andre språk

  • Reactive ion etching

URI

https://purls.helmholtz-metadaten.de/skosmos/sdv/ReactiveIonEtching

Last ned dette begrepet:

RDF/XML TURTLE JSON-LD