Anbefalt term
Chemical vapor deposition
Definisjon
Beskrivelse og avgrensning av begrepets omfang.- 1. Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. (Wikipedia). 2. A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit.(Chemical Methods Ontology)
Overordnede begreper
Videre begreper i samme vokabular.På andre språk
Termer brukt om det samme begrepet på andre språk.- Chemical vapor deposition
engelsk
URI
https://purls.helmholtz-metadaten.de/skosmos/sdv/ChemicalVaporDeposition