Anbefalt term
Atomic layer deposition
Definisjon
Beskrivelse og avgrensning av begrepets omfang.- 1. A thin film deposition technique based on the sequential reaction of gaseous precursors at a surface to produce a monolayer (Ontobee, Chemical Methods Ontology). 2. Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. (Wikipedia)
Overordnede begreper
Videre begreper i samme vokabular.På andre språk
Termer brukt om det samme begrepet på andre språk.- Atomic layer deposition
engelsk
URI
https://purls.helmholtz-metadaten.de/skosmos/sdv/AtomicLayerDeposition