Deposition

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1. The deposition process, or chemical vapor deposition (CVD) is a process whereby a fiolm is deposited by reacting chemicals together in the gaseous or vapor phase to form a film. The gases or vapors utilized for CVD are compounds that contain the element to be deposited and that may be inducted to react with a substrate or other gas(es) to deposit a film. The CVD reactoin may be thermally activated, plasma induced, plasma enhanced CVD or activated by light in photon induced CVD. (TIB, Digital Reference). 2. Deposition is normally considered to be one of two types: dry deposition is the process by which aerosols and gases in the air are deposited on the surface of the earth (soil, water, rock, plants, etc.); this is termed 'dry' deposition even when the receptor surface is moist. Wet deposition is that process which involves the transport of chemicals to the surface of the earth by water droplets or snow crystals which scavenge pollutants as they form and fall through the atmosphere. (IUPAC). 3. The process of the settling of particles (atoms or molecules) from a solution, suspension or vapour onto a pre-existing surface, resulting in the growth of a new phase. (TIB, Chemical Methods Ontology)

https://purls.helmholtz-metadaten.de/skosmos/sdv/Deposition

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