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... > Physical system > Processing and Treatment (for both Material and Sample) > Treatment > Surface treatment > Surface structuring > Surface structuring method > Lithography > Focused Ion beam lithography

Terme préférentiel

Focused Ion beam lithography  

Définition

  • 1. Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM). (Wikipedia). 2. Focused Ion Beams (FIB) enable precise material removal and modification at the nanoscale, vital for device fabrication and nanofabrication. (https://raith.com/products/focused-ion-beams/).

Concept générique

Traductions

  • Focused Ion beam lithography

URI

https://purls.helmholtz-metadaten.de/skosmos/sdv/FocusedIonBeamLithography

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