Terme préférentiel
Chemical vapor deposition
Définition
Une explication du sens précis de ce concept- 1. Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. (Wikipedia). 2. A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit.(Chemical Methods Ontology)
Concept générique
Concept générique (TG)Traductions
Termes du concept dans d'autres langues.- Chemical vapor deposition
anglais
URI
https://purls.helmholtz-metadaten.de/skosmos/sdv/ChemicalVaporDeposition