Käytettävä termi
Pulsed laser deposition
Määritelmä
Tyhjentävä kuvaus käsitteen merkityksestä.- 1. A synthesis technique where a high-power pulsed laser beam is focused (inside a vacuum chamber) onto a target of the desired composition. Material is then vaporized from the target ('ablation') and deposited as a thin film on a substrate facing the target. (TIB, Chemical Methods Ontology) 2. Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). (Wikipedia)
Yläkäsite
Merkitykseltään laajempi käsite/termi.Muunkieliset termit
Käsitteen termit muilla kielillä.- Pulsed laser deposition
URI
https://purls.helmholtz-metadaten.de/skosmos/sdv/PulsedLaserDeposition