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Ion Beam deposition

Definición

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  • 1. Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. (Wikipedia). 2. Ion beam deposition (IBD) is a thin film deposition method that produces the highest quality films with excellent precision. Also referred to as ion beam sputtering (IBS), it’s a process that’s used when tight control over film thickness and stoichiometry is needed. (https://www.dentonvacuum.com/what-is-ion-beam-deposition/)

Concepto genérico

Concepto genérico

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  • Ion Beam deposition

URI

https://purls.helmholtz-metadaten.de/skosmos/sdv/IonBeamDeposition

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