Concept information
Preferred term
Chemical vapor deposition
                         
        
Definition
- 1. Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. (Wikipedia). 2. A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit.(Chemical Methods Ontology)
Broader concept
URI
                    https://purls.helmholtz-metadaten.de/skosmos/sdv/ChemicalVaporDeposition
                    
                
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