Preferred term
Chemical vapor deposition
Definition
A complete explanation of the intended meaning of a concept- 1. Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. (Wikipedia). 2. A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit.(Chemical Methods Ontology)
Broader concept
Broader conceptIn other languages
Terms for the concept in other languages.- Chemical vapor deposition
URI
https://purls.helmholtz-metadaten.de/skosmos/sdv/ChemicalVaporDeposition