Concept information
There is no term for this concept in this language.
Preferred term
Atomic layer deposition
                         
        
Definition
- 1. A thin film deposition technique based on the sequential reaction of gaseous precursors at a surface to produce a monolayer (Ontobee, Chemical Methods Ontology). 2. Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. (Wikipedia)
Broader concept
In other languages
- 
                Atomic layer deposition
URI
                    https://purls.helmholtz-metadaten.de/skosmos/sdv/AtomicLayerDeposition
                    
                
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