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... > Physical system > Processing and Treatment (for both Material and Sample) > Treatment > Surface treatment > Mechanical and surface treatment > Mechanical and surface treatment method > Coating treatment > Coating method > Deposition coating > Chemical vapor deposition
... > Physical system > Processing and Treatment (for both Material and Sample) > Treatment > Surface treatment > Coating treatment > Coating method > Deposition coating > Chemical vapor deposition

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Chemical vapor deposition  

Definition

  • 1. Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. (Wikipedia). 2. A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit.(Chemical Methods Ontology)

Oberbegriff

In anderen Sprachen

  • Chemical vapor deposition

URI

https://purls.helmholtz-metadaten.de/skosmos/sdv/ChemicalVaporDeposition

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