Informação do conceito
Termo preferencial
Atomic layer deposition
Definição
- A thin film deposition technique based on the sequential reaction of gaseous precursors at a surface to produce a monolayer (TIB, Chemical Methods Ontology)
Conceito superordenado
URI
https://purls.helmholtz-metadaten.de/evoks/sdv/atomicLayerDeposition
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