Käsitteen tiedot
Käytettävä termi
Chemical vapour deposition
Määritelmä
- Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. (Wikipedia)
Yläkäsite
URI
https://purls.helmholtz-metadaten.de/evoks/sdv/chemicalVapourDeposition
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