Käsitteen tiedot
Käytettävä termi
Atomic layer deposition
Määritelmä
- A thin film deposition technique based on the sequential reaction of gaseous precursors at a surface to produce a monolayer (TIB, Chemical Methods Ontology)
Yläkäsite
URI
https://purls.helmholtz-metadaten.de/evoks/sdv/atomicLayerDeposition
{{label}}
{{#each values }} {{! loop through ConceptPropertyValue objects }}
{{#if prefLabel }}
{{/if}}
{{/each}}
{{#if notation }}{{ notation }} {{/if}}{{ prefLabel }}
{{#ifDifferentLabelLang lang }} ({{ lang }}){{/ifDifferentLabelLang}}
{{#if vocabName }}
{{ vocabName }}
{{/if}}