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... > Material type > Coating > Coating method > Deposition coating > Physical vapor deposition
... > Material form > Coating > Coating method > Deposition coating > Physical vapor deposition
... > Sample > Sample preparation > Sample preparation method > Mechanical and surface treatment > Mechanical and surface treatment method > Coating > Coating method > Deposition coating > Physical vapor deposition
... > Sample > Sample preparation > Sample preparation method > Material aggregation > Coating > Coating method > Deposition coating > Physical vapor deposition
... > Sample > Material > Material processing > Surface treatment > Coating > Coating method > Deposition coating > Physical vapor deposition

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Physical vapor deposition  

定义

  • 1. A synthesis technique where vaporized molecules or atoms condense on a surface, forming a thin layer. The process is purely physical; no chemical reaction occurs at the surface. (Chemical Methods Ontology). 2. Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. (Wikipedia)

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https://purls.helmholtz-metadaten.de/evoks/sdv/PhysicalVaporDeposition

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