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... > Material type > Coating > Coating method > Deposition coating > Chemical vapor deposition
... > Material form > Coating > Coating method > Deposition coating > Chemical vapor deposition
... > Sample > Sample preparation > Sample preparation method > Mechanical and surface treatment > Mechanical and surface treatment method > Coating > Coating method > Deposition coating > Chemical vapor deposition
... > Sample > Sample preparation > Sample preparation method > Material aggregation > Coating > Coating method > Deposition coating > Chemical vapor deposition
... > Sample > Material > Material processing > Surface treatment > Coating > Coating method > Deposition coating > Chemical vapor deposition

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Chemical vapor deposition  

定义

  • 1. Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. (Wikipedia). 2. A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit.(Chemical Methods Ontology)

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https://purls.helmholtz-metadaten.de/evoks/sdv/ChemicalVaporDeposition

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