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Föredragen term

Atomic layer deposition  

Definition

  • 1. A thin film deposition technique based on the sequential reaction of gaseous precursors at a surface to produce a monolayer (Ontobee, Chemical Methods Ontology). 2. Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. (Wikipedia)

Överordnat begrepp

URI

https://purls.helmholtz-metadaten.de/evoks/sdv/AtomicLayerDeposition

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