Ir para o conteúdo principal

SampleDescriptionVocabulary

Pesquisar no vocabulário

Língua do conteúdo

Informação do conceito

... > Material type > Coating > Coating method > Deposition coating > Atomic layer deposition
... > Material form > Coating > Coating method > Deposition coating > Atomic layer deposition
... > Sample > Sample preparation > Sample preparation method > Mechanical and surface treatment > Mechanical and surface treatment method > Coating > Coating method > Deposition coating > Atomic layer deposition
... > Sample > Sample preparation > Sample preparation method > Material aggregation > Coating > Coating method > Deposition coating > Atomic layer deposition
... > Sample > Material > Material processing > Surface treatment > Coating > Coating method > Deposition coating > Atomic layer deposition

Termo preferencial

Atomic layer deposition  

Definição

  • 1. A thin film deposition technique based on the sequential reaction of gaseous precursors at a surface to produce a monolayer (Ontobee, Chemical Methods Ontology). 2. Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. (Wikipedia)

Conceito superordenado

URI

https://purls.helmholtz-metadaten.de/evoks/sdv/AtomicLayerDeposition

Descarregar este conceito:

RDF/XML TURTLE JSON-LD