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SampleDescriptionVocabulary

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Język zawartości

Concept information

... > Material type > Coating > Coating method > Deposition coating > Atomic layer deposition
... > Material form > Coating > Coating method > Deposition coating > Atomic layer deposition
... > Sample > Sample preparation > Sample preparation method > Mechanical and surface treatment > Mechanical and surface treatment method > Coating > Coating method > Deposition coating > Atomic layer deposition
... > Sample > Sample preparation > Sample preparation method > Material aggregation > Coating > Coating method > Deposition coating > Atomic layer deposition
... > Sample > Material > Material processing > Surface treatment > Coating > Coating method > Deposition coating > Atomic layer deposition

Preferowany termin

Atomic layer deposition  

Definicja

  • 1. A thin film deposition technique based on the sequential reaction of gaseous precursors at a surface to produce a monolayer (Ontobee, Chemical Methods Ontology). 2. Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. (Wikipedia)

Pojęcie szersze

URI

https://purls.helmholtz-metadaten.de/evoks/sdv/AtomicLayerDeposition

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