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... > Coating > Coating method > Deposition coating > Physical vapor deposition > Pulsed laser deposition
... > Coating > Coating method > Deposition coating > Physical vapor deposition > Pulsed laser deposition
... > Sample > Sample preparation > Sample preparation method > Mechanical and surface treatment > Mechanical and surface treatment method > Coating > Coating method > Deposition coating > Physical vapor deposition > Pulsed laser deposition
... > Sample > Sample preparation > Sample preparation method > Material aggregation > Coating > Coating method > Deposition coating > Physical vapor deposition > Pulsed laser deposition
... > Sample > Material > Material processing > Surface treatment > Coating > Coating method > Deposition coating > Physical vapor deposition > Pulsed laser deposition

Terme préférentiel

Pulsed laser deposition  

Définition

  • 1. A synthesis technique where a high-power pulsed laser beam is focused (inside a vacuum chamber) onto a target of the desired composition. Material is then vaporized from the target ('ablation') and deposited as a thin film on a substrate facing the target. (TIB, Chemical Methods Ontology) 2. Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). (Wikipedia)

Concept générique

URI

https://purls.helmholtz-metadaten.de/evoks/sdv/PulsedLaserDeposition

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